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Plasma Deposition of Amorphous Silicon-Based Materials by Giovanni Bruno, Pio Capezzuto (1995, Hardcover, Illustrated) 
Plasma Deposition of Amorphous Silicon-Based Materials by Giovanni Bruno, Pio Capezzuto (1995, Hardcover, Illustrated)
Publisher: Academic Pr
Publication Date: 1995-09-01
Series: Plasma-Materials Interactions
Language: English
Format: Hardcover
ISBN-10: 012137940X
ISBN-13: 9780121379407
Product ID: EPID39624
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Details
Publication Date:1995-09-01
Series:Plasma-Materials Interactions
Editor:Arun Madan, Pio Capezzuto
Edition Description:Illustrated

Size
Length:324 pages
Height:9.5 in
Width:6.5 in
Thickness:0.8 in
Weight:22.4 oz

Industry Reviews
Amorphous silicon is now used in a range of applications, including liquid crystal displays, facsimile and photocopying machines, and solar cells; but in all cases it is applied to a large area using a plasma deposition technique. Here is a reference for researchers and graduate students in the field and engineers working on the production lines. Covers the chemistry, the diagnostics of the silicon deposition processes, the properties of silicon alloys, the reactor design for amorphous silicon deposition, the relationship between optoelectronic properties and plasma process parameters, and the development and applications of amorphous silicon-based devices. Annotation copyright Book News, Inc. Portland, Or.
Matthews

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