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Dry Etching for Vlsi by A.J. Van Roosmalen, J.A.G. Baggerman, S.J.H. Brader (1991, Hardcover) 
Dry Etching for Vlsi by A.J. Van Roosmalen, J.A.G. Baggerman, S.J.H. Brader (1991, Hardcover)
Publisher: Plenum Pub Corp
Publication Date: 1991-05-01
Series: Updates in Applied Physics and Electrical Technology
Language: English
Format: Hardcover
ISBN-10: 0306438356
ISBN-13: 9780306438356
Product ID: EPID111151
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Details
Publication Date:1991-05-01
Series:Updates in Applied Physics and Electrical Technology

Size
Height:10.3 in
Width:7.0 in
Thickness:0.8 in
Weight:21.6 oz

Industry Reviews
Based on the manual for an annual course given by the Phillips Research Laboratories in The Netherlands, reviews all aspects of etching with gas plasmas for VLSI in silicon semiconductor processing. At a level suitable for seniors and graduate students, discusses the fundamentals, systems, processes, tools, and applications. Includes 50 pages of abstracts of selected works cited in the extensive bibliography. Acidic paper. Annotation copyright Book News, Inc. Portland, Or.
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